Abstract

OES diagnostics of HMDSO/O2/CF4 microwave plasma for SiOCxFy films deposition

The purpose of the present work consists in the elaboration of numerical computing program allowing the simulation of various species behaviour present in plasma reactor during...

Advanced Materials Research 227 (2011) - 152-155 - 2011

https://www.scientific.net/AMR.227.116

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